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Explain the various steps required in the fabrication of an integrated circuit.
Lithography: The method for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface.
Etching: Selectively deleting unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents.
Deposition: Films of the several materials are applied on the wafer.
Chemical Polishing: A planarization method by applying chemical slurry with etchant agents to the wafer surface.
whycoagulant is not used in hot lime soda proces
Explain the Fermi energy The Fermi energy generally refers to the energy of the highest get quantum state in a system of fermions at absolute zero temperature.
Objectives After doing this exercise you should be able to: 1. Describe the features of the preparation room of the lab you have visited, 2. Examine and evaluate a prepar
There is an an assignment in your database named "Production of Chemicals from Coal" Do you have answers to this?
why do frosting on cakes do not fall off
A large tower is to be supported by a series of steel wires; it is estimated that the load on every wire will be 13,300 N (3000 lbf). Verify the minimum needed wire diameter, assum
Malleability of a metal is the Property by which a material can be cold-worked
explain
in the combustion of heptane in oxygen CO2 was produced.if 500kg of dry ice was produced of which 50% of the CO2 was converted to dry ice,what is the amount of heptane needed to bu
In the dryer air furnace, a natural gas containing 92.5 mole% methane, 4.8% ethane, and the remainder propane is burned with 20% excess air. The fuel enters the furnace at 25°C and
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