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Explain the various steps required in the fabrication of an integrated circuit.
Lithography: The method for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface.
Etching: Selectively deleting unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents.
Deposition: Films of the several materials are applied on the wafer.
Chemical Polishing: A planarization method by applying chemical slurry with etchant agents to the wafer surface.
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Ask queswhat is axontion #Minimum 100 words accepted#
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INTRODUCTION : You have studied about chemical hazards in Unit 13 of Block-3 and would have learnt that many chemicals are hazardous. A good practice is to exercise caution in han
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