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Explain the various steps required in the fabrication of an integrated circuit.
Lithography: The method for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface.
Etching: Selectively deleting unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents.
Deposition: Films of the several materials are applied on the wafer.
Chemical Polishing: A planarization method by applying chemical slurry with etchant agents to the wafer surface.
Bakelite is a material based on the thermosetting phenol formaldehyde resin. Produced by the reaction under heat and pressure of phenol (a toxic, colourless crystalline solid) and
What is dielectric strength? Dielectric strength: It is the high voltage / field gradient (voltage per unit thickness) which the dielectric can withstand without failure / brea
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HOW CAN I BE ABLE TO CONTROL AND BALANCE THE INPUT AND OUT-PUT
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1. In the system shown schematically below, water is supplied to a spray nozzle by a gear pump with a constant output of 20 US gpm. The flow rate of water discharged through t
Objectives After completing this exercise, you should be able to : 1. Explain the significance of the labels of the bottles containing different chemicals, 2. Classify di
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For a substance explained by the van der Waals equation of state with a constant heat capacity CV : 1) Find the internal energy U(T, V ), relative to a reference state at some T
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