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a. Location of Key: Enquire from the technicians as to who opens the laboratory. Does the lab staff have to take the keys from the office or do they have personal keys. (Also note how many keys are available for the lab and where they are located.)
b. Daily Duties Regarding Cleaning & Dusting
Enquire from the technicians as to who cleans the floors and dusts the equipment and also supervises this cleaning. During cleaning and dusting are there any precautions to be followed?
c. Daily Switching on and off of Lights and Equipment
Enquire who switches on the lights as well as equipment like distillation plants, ovens etc. in the morning and who switches them off in the evening before closing. In case of gas being used in the lab, find out if the main supply is switched off daily before the lab is closed. Also enquire:
i) if the main switch of the gas supply is located in the lab itself or elsewhere.
ii) if the technicians also know the location of mains for electricity and water supply as well as of the fire extinguisher
Mixing Salt Solutions You mix 195.0 gallons of a mixture containing 12.00 wt% NaCl (sodium chloride) and 88.00 wt% water (solution density = 1.0837 g/cm 3 ) with a V 2 -gallon
Explain Loss Angle Loss Angle can be described as the arc-tangent of the electrical dissipation factor.
A double riveted double cover butt joint is used for connecting plates 1.2 cm thick. The diameter of the rivets is 2.2 cm. The permissible stresses in tension - 100 N/mm2 The per
The various types of polarization processes are: a) Electronic polarization b) Ionic Polarization c) Orientation Polarization, and d) Space charge Polarization
how can be boiler trouble be minimised ?
A) A horizontal tube having a 1.25 cm outside diameter is submerged in a water 1 atm and 100 oC. Determine the heat flux for the surface temperature of (a) 540 o C, (b) 650 o C,
the method of extraction of alkali metals
What kind of separation processes are there?
Positive and Negative Photo resist There are two types of photo resist: positive and negative. For positive resists, the resist is exposed with UV light where the underlying ma
bernaulli''s theorm related numericals
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