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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Decarboxylation of cinnamic acid
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how does marketing concept affect chemical engineering in terms of developing a product
A insulated vessel is divided by a partition into two parts. Initially, the left side contains steam at 300C, 20 bar, and the right side is evacuated. Then, the partition is sudden
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The design of a monolith reactor for the VOCs removal.(Benzene) Therefore, you are asked to do the following: 1. Choose a specific VOC; 2. Search for the reaction rate for
What are the most important properties of permanent magnetic materials? Explain. The most important properties of permanent magnetic materials are (i) Remanence (Residu
Semi-conducting materials 1) Semi-conducting are the materials whose valence electrons are bounded somewhat loosely to their atom. 2) They needs energy less than
Wet air containing 4.0 mole% water vapor at 76°F and 14.8 psia is passed through a column of calcium chloride pellets. The pellets absorb 97% of the water and none of the other con
Positive and Negative Photo resist There are two types of photo resist: positive and negative. For positive resists, the resist is exposed with UV light where the underlying ma
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