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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
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Consider the following non-linear ordinary equation with an initial condition, y(t=0)=2. ?? ′ =4?? 0.8?? -0.5?? Compute and plot the solution as a function of time from 0 to
Water from a supply having a total head of 100 ft is used in the jet of an ejector in order to lift 10 ft3/s of water from another source (at a lower level) that has a total head o
Which one of the following statements is correct? You may wish to examine a molecular model of this compound. 1. Carbon D is an asymmetric center and its configuration is R 2
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Develop a software "program"1 to plot the equations of state we have discussed in class. The program should allow you to change Tc, Pc, and accentricityfor the substance of intere
The magnetic behavior of materials can be classified into the following five major groups: 1. Diamagnetism 2. Paramagnetism 3. Ferromagnetism 4. Ferrimagnetism 5. Antiferr
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A gas stream containing solute A at mole fraction of 0.02 is to be cleaned by absorbing 90% of the solute into a liquid stream in a countercurrent packed bed gas-liquid absorber. T
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