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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Planar defects * Grain boundaries occur where the crystallographic direction of the lattice abruptly changes. This usually happens when two crystals start growing separately an
INTRODUCTION : You have studied about chemical hazards in Unit 13 of Block-3 and would have learnt that many chemicals are hazardous. A good practice is to exercise caution in han
Ask question #Minimum 100 words accepted.hardness of bore water is less than that of sea water-justify
What are the objectives of annealing? Annealing , is a heat treatment where in a material is altered, causing alters in its properties like as strength and hardness. It is a p
how can we improve crushing strength of 20:20
FIND THE REAL ROOT OF xexp^x=3 regula falsemethod correct the three decimal placess
the method of extraction of alkali metals
1. Select a process variable (pressure / temperature / level / flow) and conduct a literature survey to determine recent developments in process instrumentation field. Ide
A insulated vessel is divided by a partition into two parts. Initially, the left side contains steam at 300C, 20 bar, and the right side is evacuated. Then, the partition is sudden
First find out the requirement of alcohol for your lab in consultation with the teacher or from records of previous years. Then fill-up F-22 form or simply write an application for
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