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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
free radical mechanism
two altitudes of an isosceles triangle are equal to 20 cm and 30 cm determine the possible measures of the base angles
kenematics of rigid body in rotation
The design of a monolith reactor for the VOCs removal.(Benzene) Therefore, you are asked to do the following: 1. Choose a specific VOC; 2. Search for the reaction rate for
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A gas-phase exothermic reaction is approved out in a multi-tube reactor with the catalyst in 1-inch. Tubes and boiling water in the jacket. The feed temperature and the jacket temp
What are its applications? (i) Direct extrusion: The billet is placed in a container and forced by the die through a piston. (ii) Indirect extrusion: The extruded part
Two parallel planes 1.2x1.2 are splited by a distance of 1.2 m. the emissivity's of the planes are 0.4 and 0.6, and the temperature are 760 and 300 oC, correspondingly. A 1.2x1.2 r
What is dielectric strength? Dielectric strength: It is the high voltage / field gradient (voltage per unit thickness) which the dielectric can withstand without failure / brea
Proximity Printing The proximity exposure method is same to contact printing except that a small gap, 10 to 25 microns wide, is maintained among the wafer and the mask during e
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