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Positive and Negative Photo resist
There are two types of photo resist: positive and negative. For positive resists, the resist is exposed with UV light where the underlying material is to be removed. In these resists, exposure to the UV light changes the chemical structure of the resist so that it becomes more soluble in the developer. The exposed resist is then washed away by the developer solution, leaving windows of the bare underlying material. In other words, "whatever shows, goes." The mask, thus, having an exact copy of the pattern which is to remain on the wafer.
A mixture of 44 mol % of a component A and 56 mol % of component B is to be separated in a distillation column. The concentration of A in the distillate is 97 mol % A and 94 % B in
Water from a supply having a total head of 100 ft is used in the jet of an ejector in order to lift 10 ft3/s of water from another source (at a lower level) that has a total head o
to determine the emf of cell uaing pottentiometre
Q1 What is wrong with each of the following attempts to write an electron configuration? Justify your answer with suitable explanation. (a) 1s22s3 (b) 1s22s22p23s2 (c) 1s22s23s2 (d
write in brief about pitting and soil corrosion
The probability of occupation of an energy level E, when E - E F = kT, is given by 0.27
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1 ΔS on rapid decompression Steam at 400C, 100 bar in an insulated cylinder is suddenly decompressed to 10 bar, by unlocking the piston and allowing the gas to expand, with a c
Blending is an important unit operation in the chemical and process industries. It is employed in a wide variety of industries including the production of cement and gasoline. Con
Proximity Printing The proximity exposure method is same to contact printing except that a small gap, 10 to 25 microns wide, is maintained among the wafer and the mask during e
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