What beam current is required in order to implant a source

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Reference no: EM131793938

An implant machine for 300-mm wafers is required to have a throughput of 60 wafers per hour.

What beam current is required in order to implant a source/drain region in a CMOS device with a dose of 1 x 10¹⁵cm^-2?

Reference no: EM131793938

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