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Outline a procedure for photolithography in the fabrication of electronic devices. What are the limitations of this procedure?
Photolithography is the process of transferring geometric shapes on a mask to the Surface of semiconductor water. The steps includes in the photolithographic process are wafer cleaning; barrier layer formation; photo resist application; soft baking; mask alignment; exposure and development; and hard-baking.
PROCEDURE : Visit any lab (physics, chemistry or biology) of your study centre or any other you can get access to and note its features. To guide you through we have listed below
Im currently undergoing design project for my degree I would like to ask regarding the Formox process. What types of fluid package should i use for HYSIS?
BLOW MOLDING
equivalant weight ofmg(hco3)2
Zeolites are used to adsorb a wide range of solutes from vapour and gas streams. What is it about their structure that makes them suitable for selective adsorption? What isotherm(s
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Hard-Baking Hard-baking is the final step in the photolithographic process. This step is essential in order to harden the photoresist and better adhesion of the photoresist to
"A semilog plot of y(logarithmic axis) versus x passes through (1,2) and (2,1)." The given equation is y=4.00exp(-0.693x).I am supposed to end up with a graph, but I''m not sure if
will u provide chemical properties of nitroparaffins and its block diagram for preparation of nitroparaffins?
a) List the dissimilar Heat transfer equipment involved in your plant. Also describe the governing principle or modes of heat transfer for every equipment that listed. Determine th
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