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Outline a procedure for photolithography in the fabrication of electronic devices. What are the limitations of this procedure?
Photolithography is the process of transferring geometric shapes on a mask to the Surface of semiconductor water. The steps includes in the photolithographic process are wafer cleaning; barrier layer formation; photo resist application; soft baking; mask alignment; exposure and development; and hard-baking.
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Thirty pounds of coal (analysis 80% C and 20% H ignoring the ash) are burned with 600 lbs of air (with a variable humidity), yielding a gas have an Orsat analysis in which the rati
Linear Alkyl benzene (LAB) is produced by the alkylation of benzene with olefins (assuming all dodecane). Raw maw materials: Kerosene and benzene. The chemical plant design comp
Among phosphate and calgon methods, which one would be the best option for internal conditioning
Ask question #Minimum 100 words accepted.hardness of bore water is less than that of sea water-justify
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