Explain in detail about the Chemical vapaor deposition

Chemical vapaor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. Process is often used in the semiconductor industry to produce thin films. In a typical CVD process, wafer (substrate) is exposed to one or more volatile precursors that react and/or decompose on the substrate surface to produce desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow by the reaction chamber.

Now adding of copper increases no. of electrons and thus collisions increase among electrons. Overall effect results in reducing the electro migration in process of metallization.