Etched grid line width, A study of the effects of 3

Etched grid line width

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Reference no: EM131001657

A study of the effects of 3 components A, B, and C on the etched grid line width in a photolithography process was carried out using a 23 factorial design with the following levels of each factor:

Factor

Low 0%

High 6%

16%

Generate a standard (un-replicated) design and analyze the following results for the response y = grid line width (in coded units) obtained in the series of 8 experiments run in randomized order, but which, for the purpose of this problem, have been rearranged in the standard order as follows: 6.6, 7.0, 9.7, 9.4, 7.2, 7.6, 10.0, and

9.8. Which effects are signi?cant?

Reference no: EM131001657

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