Developing new lithographic techniques

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In this Chapter we have discussed several different forms of lithography (i.e. photo, electron beam, x-ray, high energy ion beam). Why do companies like Intel keep developing new lithographic techniques?

What is the wavelength regime of each of the lithographic techniques listed in Problem 9? (red-visible light, green-visible light, blue light, UV (E=SeV), e-beam (acceleration voltage of 10 keV), and x-ray).

Compare wet and dry etching in terms of its directionality, selectivity, cleanliness, feature size, and controllability.

Reference no: EM131216631

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