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The functions of the oxide layer are to: 1. mask against diffusion or ion-implant 2. passivate the surface electrically and chemically 3. isolate one device from another
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Outline a procedure for photolithography in the fabrication of electronic devices. What are the limitations of this procedure? Photolithography is the process of transferrin
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fing the neceessary and sufficient conditions for the numbers s and t to make the LP problem maximise z=x+y subject to:sx+ty x;y>0 have an optimal solution be feasible b
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