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Oxidation - Silicon has the unique ability to be oxidized into silica, which produces a chemically stable, protective and insulating layer on the surface of the wafer. The production of high quality IC's requires a high quality oxide layer. The function of the oxide layer is to mask against diffusion or ion-implant, to passiviate the surface electrically and chemically, isolate one device from another and act as a component in MOS devices.
PROCEDURE : Visit any lab (physics, chemistry or biology) of your study centre or any other you can get access to and note its features. To guide you through we have listed below
merits and demerits of free radical
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compare boron and aluminium with carbon and silicon
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merits and demerits of free radical polymerisation
1. Select a process variable (pressure / temperature / level / flow) and conduct a literature survey to determine recent developments in process instrumentation field. Ide
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