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Oxidation - Silicon has the unique ability to be oxidized into silica, which produces a chemically stable, protective and insulating layer on the surface of the wafer. The production of high quality IC's requires a high quality oxide layer. The function of the oxide layer is to mask against diffusion or ion-implant, to passiviate the surface electrically and chemically, isolate one device from another and act as a component in MOS devices.
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