What must be done to the substrate doping

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Reference no: EM131788933

Question: As MOS devices are scaled to smaller dimensions, gate oxides must bereduced in thickness.

a. As the gate oxide thickness decreases, do MOS devices become more or less sensitive to sodium contamination? Explain.

b. As the gate oxide thickness decreases, what must be done to the substrate doping (or alternatively the channel VTH implant, to maintain the same VTH? Explain.

Reference no: EM131788933

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