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A quantity of air undergoes a thermodynamic cycle consisting of three internally reversible processes in series.
Process 1-2: isothermal compression from p1 = 100 kPa to p2 = 475 kPa Process 2-3: constant-pressure expansion to T3 = 390 K
Process 3-1: adiabatic expansion to the initial state
Employing the ideal gas model, if the cycle is a power cycle, determine its thermal efficiency. If the cycle is a refrigeration cycle, determine its coefficient of performance.
two refrigerators are arranged in series. one of them receives 300 kjcycle from a reservoir at 300 k. the heat
A piston-cylinder containing liquid water at 20 Celsius undergoes a constant pressure process at 25 bars, to a final temperature of 400 Celsius. Draw the T-v diagram. Determine the work and heat transfer for each of the three parts of the process (a)..
a 19th-century piston engine ran on steam. the steam supply is at 5 bar and 350oc. the steam discharges to the
Air flows through a pipe with a variable diameter at a constant volumetric flow rate of 0.5 m^3/s. Assuming the velocity profiles are uniform throughout use mass conservation to find the velocity where the diameter is 0.4m and 0.2m
two circular aluminum pipes of equal length l 24 in are loaded by torsional moments t. pipe 1 has outside and inside
a horizontal force f pushes a 10 kg block up a fricitionless ramp with a circular contour the radius of curvature of
a cylindrical tank with hemispherical ends is required to hold 150 psi of pressurized air at room temperature. the
assume the van der waals equation of state holds for the n-propane molecule c3h8. find values for the constants a and b
a rigid tank whose volume is 0.5 m3 initially containing ammonia at 20oc 1.5 bar is connected by a valve to a large
a 6 kg sphere moving at 3 ms collides with a 10 kg sphere traveling 2.5 ms in the same direction. the 6 kg sphere comes
the slider p can be moved by means of the string s while the slotted arm rotates about point o. the angular position
silicon tetrachloride sicl4 is a key chemical in the silicon chemical vapor deposition. it is used in the production of
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