Compute the surface concentration after annealing

Reference no: EM13720509

Please find the answer of all parts of the following question

Question- You've deposited a 10^-7 cm layer of al on si to make a semiconductor device.

Part 1- Determine the surface concentration after annealing for 100s with d= 10^-12 cm²/s. given that si chips are .05cm thick, would this solution be useful at 10⁵s? Explain.

I want help to compute the surface concentration after annealing.

Reference no: EM13720509

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