Calculate the angle of the si02 sidewalls

Assignment Help Chemical Engineering

Reference no: EM131216634

Discuss the major advanlagcs and disadvanlagcs of ckclron beam lithography.

Poly-Si of the following structure is to be etched using a completely anisotropic dry-etch process, to remove poly-Si at a rate of 0.1 µm /min. However, this etch process has poor selectivities: selectivity to Si02 is 5, selectivity to photoresist is 2.

(a) Sketch the cross-section after 5 minutes of etching.

(b) Calculate the angle of the Si02 sidewalls after 5 minutes of etching.

Reference no: EM131216634

Questions Cloud

Determine the cost of supplies : Question - Determined that the cost of supplies on hand was Tk. 1500 and Tk. 1200 of supplies had been used during the month

Discuss competitive and various human resource strategies : Discuss the competitive and the various Human Resource strategies that are pre-requisites for the achievement of a strategic fit

Design a photolithography and metallization sequence : Design a photolithography and metallization sequence of steps to obtain a Au square and a Ti circle on the surface of a semicond uctor wafer. Draw the shape of the mask to be used. At each appropriate step, indicate whether you use the dire..

Is the bank liable for the janitor''s negligence : Additionally, note that under the doctrine of respondeat superior the bank WILL be liable for any potential negligence of the janitor employee? What defenses will the bank assert? Assume that the jurisdiction does not recognize assumption of risk ..

Calculate the angle of the si02 sidewalls : Poly-Si of the following structure is to be etched using a completely anisotropic dry-etch process, to remove poly-Si at a rate of 0.1 µm /min. However, this etch process has poor selectivities: selectivity to Si02 is 5, selectivity to photoresist..

What future changes are predicted for the field : In what ways has forensic science grown as a discipline? What future changes are predicted for the field? What current educational and training models are available for students interested in working in the field?

Explain how she can find the common difference for sequence : Explain how she can find the common difference for the sequence. Then use the common difference to find the second term of the sequence.

Developing new lithographic techniques : What is the wavelength regime of each of the lithographic techniques listed in Problem 9? (red-visible light, green-visible light, blue light, UV (E=SeV), e-beam (acceleration voltage of 10 keV), and x-ray).

Describe the contribution of each resource to your research : Delinquency have published reports indicating that Ted Bundy suffered from narcissistic personality disorder. The scholarly source would then focus on the personality disorders diagnosis. Describe the contribution of each resource to your research..

User Account

All Pages