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Routine monitoring at a chemical process facility has detected fugitive emissions (leaks) of volatile organic compounds around several equipment valves, pump and compressor seals. Leaks were detected at 5 compressor seals, 57 light liquid valves, 8 gas/vapor valves, and 2 light-liquid pump seals. Using the source emission factors given below, estimate the annual fugitive emission of VOCs that would occur from this facility if these leaks were not repaired. This facility operates 24 hours per day and never shuts down.
Hard-Baking Hard-baking is the final step in the photolithographic process. This step is essential in order to harden the photoresist and better adhesion of the photoresist to
Explain Dipole Relaxation Dipole Relaxation is the method, occupying a specific period of time after a change in the applied electric field, in which the orientation polariza
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PROCEDURE: Activity 1: Invitation of quotations. A format for inviting a quotation is given below. You are required to fill up the form for finding out the prices of the follo
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Mask Alignment and Exposure One of the most significant steps in the photolithography process is mask alignment. A mask or "photomask" is a square glass plate with a patterned
how do you write a report about conductometric titration
Explain the mechanism of ferromagnetism Ferromagnetism is the basic mechanism by which certain materials (like iron) form permanent magnets and/or exhibit tough interactions
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structure of EDTA and estimation of hardness of water by Edta method
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