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Explain the various steps required in the fabrication of an integrated circuit.
Lithography: The method for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface.
Etching: Selectively deleting unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents.
Deposition: Films of the several materials are applied on the wafer.
Chemical Polishing: A planarization method by applying chemical slurry with etchant agents to the wafer surface.
Q1 What is wrong with each of the following attempts to write an electron configuration? Justify your answer with suitable explanation. (a) 1s22s3 (b) 1s22s22p23s2 (c) 1s22s23s2 (d
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explain the working of calomel electrode
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can you suggest all the required softwares for project management in chemical engineering in oil and gas sector designing
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Your first assessment will cover the design of a monolith reactor for the VOCs removal. Therefore, you are asked to do the following: 1. Choose a specific VOC; 2. Search for the
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