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Explain in detail about the Chemical vapaor deposition
Chemical vapaor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. Process is often used in the semiconductor industry to produce thin films. In a typical CVD process, wafer (substrate) is exposed to one or more volatile precursors that react and/or decompose on the substrate surface to produce desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow by the reaction chamber.
Now adding of copper increases no. of electrons and thus collisions increase among electrons. Overall effect results in reducing the electro migration in process of metallization.
structure of 2-ethylbutanoic acid
Q. Write electron configuration for a neutral atom of silicon? Writing Electron Configurations by means of Noble-Gas Notation Use noble-gas notation to write the electron confi
For an electron if the uncertainty in velocity is Δ v , the uncertainty in its position( Δ x ) is given by: (1) hm/ 4 Π Δ b (2) 4 Π / hm Π v
Write the maximum possible coordination number of an atom in an hcp crystal structure of an element? Illustrate the formula relating pressure of a gas with its mole fraction in
Which forms a crystal of Nacl: (1) Nacl molecules (2) Na + and cl - ions (3) Na andcl atoms (4) None of the above Ans: Na + and cl - ions
Physical properties of alkyl halides (1) Physical state: Methoxy methane and methoxy ethane are gases whereas other members are volatile liquid along with pleasant smell.
According to heisenberg uncertainty principle: (1) E=mc 2 (2) Δ x × Δp ≥ h/ 4 Π (3)γ = h/ p (4) Δ x × Δ = h / 6 Π Norma
The gas stream from a sulfur burner is composed of 15-mol% SO 2 , 20-mol% O 2 , and 65-mol% N 2 . This gas stream at 1 bar and 680°C enters a catalytic converter, where the SO 2
Number of protons, neutrons and electrons in the element 231/89 y is: (1) 89, 231, 89 (2) 89, 89, 242 (3) 89, 142, 89 (4) 89, 71, 89 Ans: 89, 142, 89
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